只用于動物實驗研究等 Poly(9,9-di-n-octylfluorenyl-2,7-diyl), known as F8 or PFO, is a polyfluorene specifically optimised for a variety of organic electronic applications. General InformationFull name | Poly(9,9-di-n-octylfluorenyl-2,7-diyl) | Synonyms | | Chemical formula | (C29H41)n | CAS number | 19456-48-5 | Recommended solvents | Toluene, xylene, chlorobenzene | Classification / Family | Polyfluorenes, Benzothiodiazoles, Organic semiconducting materials, Semiconducting polymers, OLED green emitter materials, OLED materials, Organic Photovoltaic materials, Polymer solar Cells, OFET materials |
Batch DetailsBatch number | MW | MN | PDI |
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M161 | 114,050 | 37,910 | Out of stock | M162 | 85,983 | 31,040 | 2.77 |
Chemical structure of PFO (F8). CAS No.: 19456-48-5. Chemical formula: (C29H41)n. CharacterisationF8 distribution plot. ApplicationsFor a high-efficiency green OLED we recommend blending F8 with F8BT with the below specifications. This ink can then be applied either in air, or in a glovebox, with little difference in performance (provided exposure time and light levels are minimised). For more details see our fabrication guide. Ossila材料PFO CAS:19456-48-5 At typical concentrations of 10 mg/ml, 100 mg of F8 (PFO) will make around 200 devices on Ossila's standard ITO substrates (20 x 15 mm), assuming 50% solution usage (50% loss in filtering and preparation). OLED reference device: - F8 with F8BT
- Blend ratio of 19:1 (F8:F8BT) in Toluene
- Total concentration of 10 mg/ml
- 0.45 μm PTFE filter
- Spun at 2000 rpm (approx. 70 nm thickness)
Ossila材料PFO CAS:19456-48-5 Pipetting 20 μl of the above solutions onto a substrate spinning at 2000 rpm should provide a good even coverage, with approximay 70 nm thickness. The substrate needs to be spun until dry, which is typically only a few seconds — 15 seconds should be ample to achieve this. Thermal annealing should be undertaken at 80°C for 10 minutes prior to cathode deposition. Typical device architectures and performanceA basic, efficient OLED can be made using PEDOT:PSS as a hole-transport layer and Calcium/Aluminium as the electron contact. When used with the Ossila ITO substrates and shadow masks this produces an easy to fabricate yet efficient >100 cd/m2) device. |